CVD Deposition Rate Calculator
Divide the deposited film thickness (final thickness minus initial thickness) by the process time to get the average CVD deposition rate.
Description
Calculate average chemical vapor deposition rate in nanometers per minute from deposited film thickness and process time.
This calculator turns a measured CVD film thickness gain over a timed run into an average deposition rate. It is suited to process summaries and rough timing estimates when nucleation and growth remain comparable between runs.
When to use CVD Deposition Rate Calculator
- Convert a post-deposition thickness measurement into nm/min
- Compare average CVD growth across recipe splits
- Estimate a first-pass duration for a target film thickness
How the calculation works
Deposited thickness is final thickness minus the starting thickness. Dividing that gain by the total process time gives the average rate over the interval.
average CVD rate = deposited thickness / deposition time Interpreting the result
A zero thickness gain returns zero. The value does not separate nucleation delay from steady-state growth or reveal within-wafer nonuniformity.
Assumptions and limitations
- Process time must be positive and thickness gain cannot be negative.
- Use the same thickness definition, metrology method, and wafer sampling plan when comparing runs.
- Gas transport, surface kinetics, temperature, pressure, depletion, and incubation are not modeled.