Silicided Source Drain Resistance

Series source/drain resistance from silicide sheet resistance, rectangular squares and two contact resistances.

Description

Series source/drain resistance from silicide sheet resistance, rectangular squares and two contact resistances.

Silicided Source Drain Resistance is a focused tool for the following task. Series source/drain resistance from silicide sheet resistance, rectangular squares and two contact resistances. It reports Total Ohms from the values you provide rather than inventing measurements, coefficients, or professional judgment that are not part of the input.

When to use Silicided Source Drain Resistance

Use this semiconductor calculation for first-order device, material, fabrication, interconnect, packaging, or reliability estimates when every coefficient and unit convention is known.

Sheet Ohms Per Square (Ω/□)
Required number in Ω/□.
Length Micrometers (µm)
Required number in µm.
Width Micrometers (µm)
Required number in µm.
Contact Ohms (Ω)
Required number in Ω.

The cited overview of Semiconductor device supplies background for the terminology and domain context used by this tool.1

How Silicided Source Drain Resistance works

Series source/drain resistance from silicide sheet resistance, rectangular squares and two contact resistances. Inputs are interpreted exactly in the displayed units and the calculation returns the following fields without presentation rounding.

Total Ohms (Ω)
Returned number in Ω.

Limitations and assumptions

  • Material composition, geometry, process history, temperature, electric field, bias, interfaces, parasitics, and fitted parameter ranges can invalidate a compact semiconductor model.
  • Sheet Ohms Per Square must be at least 0.
  • Length Micrometers must be at least 0.
  • Width Micrometers must be at least 0.
  • Contact Ohms must be at least 0.
  • Use finite inputs in the displayed units, preserve source measurements and assumptions, and independently verify consequential decisions.

Alternative or Complementary approaches

Compare the estimate with measured process data, current device documentation, and a higher-fidelity circuit, field, thermal, quantum, or TCAD model when the decision requires it.

References

  1. Semiconductor device — Wikipedia contributors

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