Use this semiconductor calculation for first-order device, material, fabrication, interconnect, packaging, or reliability estimates when every coefficient and unit convention is known.

Wavelength (nm)

Required number in nm. Exposure wavelength of the lithography system.

Numerical aperture

Required number. Numerical aperture of the projection optics.

k2 factor

Required number. Process-dependent k2 factor.

The cited overview of Photolithography supplies background for the terminology and domain context used by this tool.^[1]

Compute the lithographic depth of focus from the k2 factor, exposure wavelength, and numerical aperture. Inputs are interpreted exactly in the displayed units and the calculation returns the following fields without presentation rounding.

Depth of focus (nm)

Returned number in nm. Depth of focus of the aerial image.

• Material composition, geometry, process history, temperature, electric field, bias, interfaces, parasitics, and fitted parameter ranges can invalidate a compact semiconductor model.
• Wavelength must be at least 5e-324.
• Numerical aperture must be at least 5e-324.
• k2 factor must be at least 5e-324.
• Use finite inputs in the displayed units, preserve source measurements and assumptions, and independently verify consequential decisions.

Compare the estimate with measured process data, current device documentation, and a higher-fidelity circuit, field, thermal, quantum, or TCAD model when the decision requires it.

• Rayleigh Resolution Calculator

  Compute the Rayleigh lithographic resolution from the k1 factor, exposure wavelength, and numerical aperture.

• Overlay Budget Calculator

  Compute the overlay accuracy budget as a fraction of the lithographic pitch.

• Ring Resonator Q Factor Calculator

  Compute the quality factor of an optical ring resonator from its resonance wavelength and full-width half-maximum linewidth.