Morphology Tools

Browse all available morphology tools.

Available tools

Binary Mask Boundary Connected Background Mask Select background components connected to the explicit finite mask boundary under chosen four/eight connectivity; no infinite-image topology inference.
Binary Mask Component Cell Area Table Count cell areas of explicit four/eight-connected binary-mask foreground components; area is cells only, not calibrated physical area.
Binary Mask Component Size Selector Retain entire connected foreground components only when their explicit cell count falls in inclusive caller bounds, no partial size trimming.
Binary Mask Eight Connected Component Labels Label eight-connected foreground components of a supplied binary mask using row-major discovery and deterministic flood-fill; zero is background, no object identity inference.
Binary Mask Enclosed Hole Area Table Inventory enclosed background component cell counts under explicit connectivity, excluding all boundary-connected zero regions.
Binary Mask Enclosed Hole Fill Fill only zero components not touching the finite mask boundary under explicit connectivity, preserving existing foreground and bounded frame.
Binary Mask Explicit Stencil Black Hat Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; return signed closing-minus-input black-hat; finite-border artifacts and arbitrary stencil effects remain explicit.
Binary Mask Explicit Stencil Closing Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; perform closing: dilation followed by erosion with zero extension at each bounded stage; finite-border artifacts are retained.
Binary Mask Explicit Stencil Dilation Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; dilate via reflected-offset membership: output(x)=any input(x-offset); asymmetric supplied stencils are honored.
Binary Mask Explicit Stencil Erosion Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; erode by requiring all input(x+offset) positions; no padding of ones or inferred symmetric stencil.
Binary Mask Explicit Stencil Gradient Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; return signed dilation-minus-erosion gradient, retaining signed evidence for stencils lacking the origin rather than silently clipping.
Binary Mask Explicit Stencil Opening Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; perform opening: erosion followed by dilation with zero extension at each bounded stage; finite-border artifacts are retained.
Binary Mask Explicit Stencil Top Hat Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; return signed input-minus-opening top-hat, with finite-stage zero borders and no hidden clipping.
Binary Mask Four Connected Component Labels Label four-connected foreground components of a supplied binary mask using row-major discovery and deterministic flood-fill; zero is background, no object identity inference.
Binary Mask Hit Miss Stencil Match Explicit binary masks <=64x64 and unique integer [row,column] stencil offsets in +/-16, outside treated as zero; match explicit disjoint foreground-one and background-zero offsets; outside satisfies background only, no inferred structuring element.
Binary Mask Isolated Cell Remover Remove only isolated one-cell foreground connected components under caller four/eight adjacency; larger components remain unchanged.
Binary Mask Neighbor Majority Filter Apply a strict local 3x3 majority filter with explicit center inclusion; outside zeros participate in fixed neighbor count and ties become zero.
Binary Mask Seed Component Mask Select only the connected foreground component containing a supplied in-bounds cell; a background seed yields label zero and an empty mask.
Binary Mask Stencil Offset Reflection Reflect explicit bounded binary-mask stencil offsets about the origin without changing their order; used for asymmetric dilation/erosion conventions.
Binary Mask Stencil Required Radius Budget Budget explicit stencil row/column halo radii and maximum Chebyshev radius without expanding a kernel or inferring physical pixel dimensions.